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Process Control
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Reduced Resist Consumption
- Solvent Pre-Wet Addition to Coater
- Programmed stream solvent dispense at wafer center
- Available with any resist pump (no RRC pump/controller required)
- Mark V, Vz, 7/8 versions

Syringe Dispense
- 55cc N2 pressurized syringe dispense
- Pressure/time control
- Controlled as one of 4 maximum coater dispenses

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